Low Pressure Hg Lamp

Product Description

Commodity name: low pressure hg lamp

With the rapid development of optoelectronics industry, the cleaning process is becoming more and more important in optoelectronic products, and the influence of cleaning on the quality, accuracy and appearance of products is also getting higher and higher.

At present, the cleaning method widely used abroad is low pressure hg lamp, which can avoid pollution caused by the use of organic solvents, and can shorten the cleaning process.

First, the working principle of low pressure mercury lamp

The photosensitive oxidation of organic compounds is used to remove the organic substances attached to the surface of the material, and the surface of the material can reach "atomic cleanliness" after light cleaning. More specifically: UV light source emits light waves with wavelengths of 185nm and 254nm, with high energy, when these photons act on the surface of the cleaned object, most hydrocarbons have a strong absorption capacity for 185nm wavelength ultraviolet light, absorbing the energy of 185nm wavelength ultraviolet light They break down into ions, free atoms, excited molecules, and neutrons.

Oxygen molecules in the air also produce ozone and atomic oxygen after absorbing ultraviolet light at 185nm. Ozone also has a strong absorption of 254nm wavelength ultraviolet light, and ozone is broken down into atomic oxygen and oxygen.

Among them, atomic oxygen is extremely active, under its action, the decomposition of carbon and hydrocarbons on the surface of the object can be combined into volatile gases: carbon dioxide and water vapor escape from the surface, thus completely removing the carbon and organic pollutants attached to the surface of the object.

Low pressure mercury lamp Application

• liquid crystal display devices
• semiconductor silicon wafers
• integrated circuits
• high-precision printed circuit boards
• optical devices
• quartz crystals
• sealing technology
• metal materials with oxide filmand so on.

Low pressure mercury lamp Main materials

• Ito glass
• optical glass
• chromium plate
• mask plate
• polished quartz crystal
• silicon wafer and metal with oxide film for precision cleaning.

Can remove dirt

• organic dirt
• human sebum
• cosmetic oil
• resin additives and polyimides
• paraffin
• rosin
• lubricating oil
• residual photoresist,etc.

This UV light source also has the characteristics of UV modification (UV surface qualitative change) in the LCD process.

At present, in the production process of liquid crystal display STN, it is mainly used in film treatment technology, which is very effective for improving the close contact between film and film, such as ITO film and photosensitive film layer, TOP coating and PI coating. In the research department can also be used for UV Modified plastic material products for nanotechnology research, the product by UV light exposure to chemical reactions, so that the surface Properties of the product change.

In the production process of STN-LCD, color filter and OLED, some process equipment is quite impressive Surface properties change. In the production process of STN-LCD, color filter and OLED, some process equipment is quite similar, the difference is that the manufacturing process requirements are different.

With the refinement of the line and the color ratio of the product, the requirements of the LCD industry for the manufacturing process are constantly improving, and there is the demand for "work to do its job well, must first benefit its instrument", so only the equipment capacity is constantly improved, in order to improve the quality and efficiency of production.